Terefilm Photopolymer is a groundbreaking material designed to tackle the critical challenges faced by the semiconductor industry, such as precise mass transfer, high-resolution photolithography, and the need for reliable temporary bonding and debonding. It excels in offering a perfect balance between patternability and decomposition, enabling high throughput applications that demand stringent cleanliness and precision. With an ability to withstand thermal conditions up to ~180°C prior to UV exposure, Terefilm integrates seamlessly into manufacturing workflows involving elevated temperatures.
Upon exposure to low energy UV light, Terefilm undergoes a significant reduction in decomposition temperature, making it incredibly energy-efficient. This transition is supported by acid catalysis, enhancing the photopolymer's swift conversion to a gaseous state without residue, thereby eliminating the requirement for intensive downstream cleaning processes. This feature is crucial for maintaining the cleanliness required for high-performance device fabrication.
Its low activation energy sets Terefilm apart, facilitating significant cost savings and enhanced process efficiency. By permitting selective release of components, it supports advanced manufacturing techniques like Laser Induced Forward Transfer (LIFT), ensuring precise placement and handling of delicate components. Terefilm's clean decomposition and precise patterning capabilities mean that it's uniquely positioned to enhance manufacturing processes that demand precision and efficiency.
