Terefilm Photopolymer represents a cutting-edge advancement in material technology specifically tailored for semiconductor manufacturing. This innovative photopolymer addresses key challenges in the industry, such as precision mass transfer and high-resolution photolithography, by offering an unparalleled balance of patternability, decomposition cleanliness, and low activation energy. These features make Terefilm an ideal choice for high-throughput semiconductor applications that demand precise control and rigorous cleanliness standards.
The Terefilm material offers thermal stability at temperatures up to approximately 180°C before UV exposure, thereby integrating smoothly into manufacturing workflows that involve elevated temperatures. When exposed to low-energy UV irradiation, the decomposition temperature is reduced by over 100°C, significantly lowering the energy required for vaporization. This process is further facilitated by acid catalysis involving photoacid generators, enhancing the decomposition efficiency akin to photoresists.
One of the hallmark benefits of Terefilm is its low activation energy requirement, which enables it to operate at temperatures around 60°C. This feature leads to reduced power consumption and longer optical component lifetimes, making large area processing feasible. Moreover, the material's ability to vaporize completely under activation ensures no residual particles remain, eliminating the need for extensive cleaning post-processing. Consequently, Terefilm finds extensive utility in applications such as MicroLED mass transfer, where selective component release via laser transfer is essential.
